专利详情

专利名称	Molecular glass photoresists containing bisphenol a framework and method for preparing the same and use thereof
申请号	US201214385238	专利类型	US
公开（公告）号	US9454076(B2)	公开（授权）日	2016.09.27
申请（专利权）人	中国科学院化学研究所	发明（设计）人	Yang Guoqiang;Xu Jian;Chen Li;Wang Shuangqing;Li Shayu
主分类号	C07C43/205	IPC主分类号	C07C43/205;G03F7/004;C07C69/96;C07C39/16;C07C39/17;C07C43/21;G03F7/00;G03F7/038;G03F7/039;C07C37/16;C07C39/15;C07C41/01;C07C68/06
专利有效期	Molecular glass photoresists containing bisphenol a framework and method for preparing the same and use thereof 至Molecular glass photoresists containing bisphenol a framework and method for preparing the same and use thereof	法律状态
说明书摘要	The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated with a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives into a positive or negative photoresist. A photoresist with a uniform thickness is formed on a silicon wafer by spin-coating. The photoresist formulation can be used in modern lithography, such as 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, electron beam lithography, and particularly in the EUV-lithography technique.;