High-purity tellurium dioxide single crystal and manufacturing method thereof
- 申请号:US201013262209
- 专利类型:US
- 申请(专利权)人:中国科学院上海硅酸盐研究所
- 公开(公开)号:US8480996(B2)
- 公开(公开)日:2013.07.09
- 法律状态:
- 出售价格: 面议 立即咨询
专利详情
专利名称 | High-purity tellurium dioxide single crystal and manufacturing method thereof | ||
申请号 | US201013262209 | 专利类型 | US |
公开(公告)号 | US8480996(B2) | 公开(授权)日 | 2013.07.09 |
申请(专利权)人 | 中国科学院上海硅酸盐研究所 | 发明(设计)人 | GE ZENGWEIZHU YONGWU GUOGINGYIN XUEJITANG LINYAOZHAO HANBINGU LIZHE |
主分类号 | C01B19/04 | IPC主分类号 | C01B19/04;C30B11/02;C30B15/00 |
专利有效期 | High-purity tellurium dioxide single crystal and manufacturing method thereof 至High-purity tellurium dioxide single crystal and manufacturing method thereof | 法律状态 | |
说明书摘要 | A high-purity tellurium dioxide (TeO2) single crystal and its manufacturing method are provided. The method comprises the following procedures: firstly performing a first single crystal growth, and then dissolving the resulting single crystal again, thereafter adding a precipitation agent to form powder, and finally performing a second single crystal growth of as-prepared powder to obtain the high purity single crystal. The TeO2 single crystal prepared according to present invention is of high purity, especially with a content of radioactive impurities such as U and Th decreased to a level of 10-13 g/g. |
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